![Cover Image for System.Linq.Enumerable+EnumerablePartition`1[System.Char]](https://coverimages.igi-global.com/images/search-article.png)
Waveguide integrated GaN distributed Bragg reflector cavity using low-cost nanolithography
Simeng Jia, Emmanuel D. Le Boulbar, Krishna C. Balram, Jon R. Pugh, Tao Wang, Duncan W.E. Allsopp, Philip A. Shields, Martin J. Cryan
OAI: oai:purehost.bath.ac.uk:openaire_cris_publications/83111dd2-26ae-43d5-a7e3-2522c9bec85f • DOI: https://doi.org/10.1049/mnl.2019.0366
Abstract
This work presents the design, fabrication and measurement of gallium nitride (GaN) distributed Bragg reflector cavities integrated with input and output grating couplers. The devices are fabricated using a new, low-cost nanolithography technique: displacement Talbot lithography combined with direct laser writing lithography. The finite-difference time-domain method has been used to design all the components and measured and modelled results show good agreement. Such devices have applications in GaN integrated photonics and biosensing.